Quarterly of Applied Mathematics

Quarterly of Applied Mathematics

Online ISSN 1552-4485; Print ISSN 0033-569X



Asymptotic solution for nonlinear chemical vapor deposition problems

Authors: B. Cassis, O. Tikhomirov and B. A. Wagner
Journal: Quart. Appl. Math. 51 (1993), 585-597
MSC: Primary 80A30; Secondary 76R99, 80A32
DOI: https://doi.org/10.1090/qam/1233532
MathSciNet review: MR1233532
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Abstract: The problem of chemical vapor deposition involving reaction kinetics of any order $ n$ at a heated substrate is considered. The deposition process is then described by a convective diffusion equation, coupled to nonlinear boundary conditions, describing the chemical reaction taking place at the heated substrate, where the nonlinearity is given in terms of the order $ n$ of the reaction kinetics. We derive boundary layer equations and use a combination of perturbation and similarity methods to find the deposition rate along the susceptor.

References [Enhancements On Off] (What's this?)

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DOI: https://doi.org/10.1090/qam/1233532
Article copyright: © Copyright 1993 American Mathematical Society

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